In the photovoltaic industry, the solar cell wafer is the key component, and the wafer process involves several steps, among which the surface velvet and pickling, etching and other steps are more critical.
Cleaning is mainly the use of NaOH, HF, HCL and other chemical solutions for silicon wafer corrosion treatment, in order to remove the surface impurities and flattening, and then by chemical etching method also that the silicon wafer in hydrofluoric acid solution soaked, so that it produces a chemical reaction to generate soluble complex and substance hexafluoro silicic acid, in order to remove the diffusion system junction in the silicon wafer surface formed after a layer of phosphorus silicate glass. Then use plasma etching technology to PSG (Phosphor Silicate Glass), generally using wet etching, which requires the use of liquid HF, H2SO4 (used to increase the concentration of hydrogen ions), KOH (alkali wash), these solutions are strong acids and strong alkalis, there is a strong corrosive transport equipment, chemical pumps recommended to choose QEEHUA magnetic pump, pump material selection PVDF or CFRETFE, effectively extend the service life of corrosion-resistant pumps.
Focus in the photovoltaic manufacturing process
Phosphor silica glass removal.
Process wastewater treatment.